Surface preparation tools and wet benches: volume matters.
The spectrum of KINETICS systems ranges from batch immersion to spray or single wafer applications to wet benches. All can be configured from manual to full multitasking automation.
KINETICS wet benches are designed for repeatability and volume, with an emphasis on processes with two or more processing tanks. Built to current SEMI standards, our wet process stations are available in fully automated, semi-automated and manual configurations.
- FEOL, BEOL or advanced packaging modules
- Cleaning, resist strips, etching, development, metal lift-off, IPA recovery and drying
- Usable for acid, base and solvent applications
- Single or multi-cassette bath sizes
- Silicon wafers from 100mm to 450mm, III-V materials, photomasks, glass and large manifolds
- Customized substrates
