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Kinetics has extensive experience designing and delivering highly-precise systems for the most critical oxide, tungsten, polysilicon, STI and copper CMP processes. Systems are available for dispensing pre-mixed slurry materials, or for blending and dispensing very challenging slurry mixtures. Kinetics slurry equipment supports the most demanding CMP planarization processes, in leading microelectronics facilities, worldwide.
The Kinetics SB 100 Slurry Blend & Dispense system is designed to provide the highest levels of CMP slurry quality and availability for advanced semiconductor processing. Featuring the Kinetics proven weight-based blending and slurry measurement methodologies, the SB 100 is a highly-effective system that you can trust.
The Kinetics SB 200 Slurry Blend & Dispense duel-tank system provides accurate and reliable blending technology to meet critical CMP process requirements. Featuring the Kinetics proven weight-based blending and slurry measurement methodologies, the adaptive nature of the SB 200 supports a variety of blend ratios, constituents and slurry shelf-life requirements.
The Kinetics SD 100 Slurry Dispense System is a reliable and configurable dispense system for critical slurry process applications. The system features configurable slurry management resources, designed to minimize slurry settling, agglomeration and damage.