As with other process media distribution systems from Kinetics, slurry delivery systems are critical to the success of leading microelectronics companies worldwide. At the core is the ability to meet requirements with a sense of urgency while continuing to uphold standards.
Through considered design and agile manufacturing, Kinetics supports the most demanding chemical mechanical planarization (CMP) processes being performed today. The key is planning for anticipated irregularities like materials variances, operating conditions, and personnel supervising the process.
Kinetics’ extensive experience in both designing and delivering high precision slurry systems is well documented. Whether delivering pre-mixed slurry materials or blending and dispensing extremely challenging slurry mixtures, Kinetics is prepared to respond. This includes highly critical oxide, tungsten, polysilicon, STI, and copper CMP slurry processes.
The Kinetics SD 100 Slurry Dispense System is a reliable and configurable dispense system for critical slurry and CMP process applications. To ensure availability of slurry dispensed to the fab, it adapts to single- or dual-source containers for dispensing pre-mixed slurry to the CMP polisher tools, or an optional day tank that accommodates contents of multiple supply drums.
The Mega SD 100 Series supplies raw slurry to the SBD system from one of two totes/drums. As raw slurry is depleted from one tote/drum, the Mega SD 100 Series replenishes the supply from the other tote/drum.
On demand from the SBD System, one tote/drum recirculates through the raw slurry supply loop to the host until the demand is met. Manual modulation of a multi-turn flow throttling valve, located on the raw slurry loop return line, compliments the supply sub-system by maintaining a proper back pressure and flow to the blend system.
The Mega SF100 Series system consists of three pairs of 20” filter bowl/head assemblies configured to permit simultaneous filtration of blended slurry material from a single or dual source, and to dispense to two global loops; one pair of filters is associated with each loop discharge, while the third pair of filters is used to maintain loop supply when filter cartridge change-out is required.
The Mega SF 200 Series system consists of two successive 20” filter bowl/head assemblies on a single bank. One filter bank is active, leaving the remaining bank in standby. The standby filter bank is brought online and filled with slurry to enable the online filter bank to be brought offline when filter cartridge change-out is required.
The Mega SF 300 Series system consists of two 20” filter bowl/head assemblies on one bank, automatic valves to control the flow of slurry, and a set of pressure gauges to read filter inlet and outlet pressures. Multiple configurations are available using the two filter elements: series, parallel, and a combination of series and parallel.