Facility Support Equipment


With over eleven different metals involved, and 300 wafer process steps that must be performed in an ultra-clean environment, to say that semiconductor devices manufacturing has some unique challenges would be an understatement. As manufacturers continue to push to finer technology nodes, meeting today’s tight requirements requires the expertise that only comes with decades of experience.

Kinetics Solutions Group’s extensive line of specialty products and facility support equipment has supported the unique needs of wafer process steps for over 40 years. From the world’s first recirculating cleaning tank for silicon wafers, to a complete turnkey wet process systems and support equipment for diverse applications, Kinetics Solution Group’s products stand the test of time.

The magic happens in a 28,000 sq. foot facility in Livermore, CA, where numerous fabrication tools and support facilities required for specialized manufacturing are put through their paces daily, serving the global manufacturing industry.

For product inquiries please contact Sales.Team@kinetics.net or call WAFAB at +1-925-455-5252


MEGATHERM™ High Temperature Quartz Baths were developed to stand up to the rigors of resist stripping, RCA cleans, and silicon nitride etch. The product line was designed especially for a low contamination and particle-free environment.


The Center Feed™ was the semiconductor industry’s first recirculating and filtered bath, and is the basis for the Chemkleen™ bath, today’s gold standard. Primarily used for HF, BOE, and KOH applications, Chemkleen features a four-sided weir basket, customized filter chamber, heat exchange coils, and a compact immersion pump.


Kinetics designed its immersion pumps exclusively to meet the rigorous requirements of the semiconductor industry for recirculating filtered etch modules. Manufactured to be contamination-free and provide trouble free and efficient operation, pumps can be adapted for portable or stationary applications.


Kinetics manufactures a complete line of circulators for precision temperature control and low maintenance. WHRV and WHO are specifically designed for the semiconductor industry and used to control temperature in filtered etch modules and other chemical tanks where temperature stability and uniformity are vital.


The MICROKLEEN™ Quick Dump Rinsers are designed with top adjustable spray rails, external bottom fill rails, and a larger dump door. These features allow the dump rinsers to fill faster, dump in a matter of seconds, and use less water.


Kinetics Chemblast™ series of pump stations are designed for situations where there is no AWN available, or the process tool is located away from the AWN. The pump stations collect spent chemistry from a dedicated tool, then pump it to the AWN or to a collection point.


Whenever humidity-sensitive devices need environmental protection, Kinetics’ product line of desiccator shelves and storage cabinets are indispensable.


The goal of the lab glove box is to isolate and separate the operator from the devices within the controlled environment of the glove box. Glove boxes and other containment chambers are available in custom designs for every application and budget.


Kinetics offers special quartz tube cleaning systems for thorough internal and external tube surface cleaning of diffusion tubes and similar quartzware.


The Kinetics standard bottle wash station was designed to clean and hold up to 8 one-gallon bottles. It consists of two independent horizontal bottom spray rails with 4 vertical spray towers that assist in sliding the bottles.


Bottle Carts are indispensable in active work areas where a handy and safe means for transporting bottled chemicals is required. Kinetics’ Bottle Carts are available in a variety of configurations.


Kinetics also offers competitively priced custom configured steel worktables.


The Chemtran™ series of mobile chemical carts safely transports fresh or spent chemistry between the fab and waste dump sites. Safety features include 110% secondary containment, pneumatic pumps, chemical-fill-level sight tubes and over-fill shut-off features that provide a safe and handy alternative to more costly chemical transport techniques.

The Latest

Win wafer processing, one step at a time

Plan your upgrade path, with powerful choices at every turn.

Few manufacturing processes take those who embark upon them to such lengths—and depths—as wafer processing. As a consequence, the number of variables threatens to become overwhelming, or push producers toward making decisions about what needs to be assumed versus pursued.

Kinetics, with a world of experience in the industry, transforms complexity into a series of meaningful choices. Through the end-to-end process, even well-established facilities are given new freedom to maintain or raise standards, manage costs and optimize output.

While the company offers comprehensive design, planning and construction services, the components intrinsic to ongoing operation are offered as an array of choices. All move through Kinetics’ Livermore, California operations base, where 28,000 sq. ft. is devoted to specialized manufacturing fabrication, validation and logistics support.

Step by step, the growing product line continues to evolve as production requirements rise, environmental and safety requirements become more stringent, and the economics of wafer processing tighten. Across all 12 current categories, five criteria apply.

  • Criteria No. 1: SAFETYProtecting people, facilities, surrounding environments and wafers is beyond optional. Controls and displays keep operators in touch with conditions and process steps, as do relevant warning and emergency shut-off systems. Recirculating baths are representative of the care Kinetics takes to ensure structural integrity in HF, BOE and KOH applications.
  • Criteria No. 2: DURABILITY 

    For example, MEGATHERM™ High Temperature Quartz Baths confront the powerful chemistry attached to resist stripping, RCA cleans and silicon nitride etches. Ditto for immersion pumps that are designed to be trouble-free across thousands of cycles and an evolving lineup of operators. And products including work tables must hold up their end of the bargain in the months and years ahead.

  • Criteria No. 3: CONTROL 

    WHRVTM and WHOTM Temperature Controlled Circulators showcase Kinetics’ relentless pursuit of precision. Here, temperature stability and uniformity are well beyond the realm of average, whether heater or chiller is required. Regardless of whether the equipment module requires constant or periodic monitoring, control needs to be accommodated starting at the product design stage.

  • Criteria No. 4: CYCLE TIMES 

    MicroKleen™ Quick Dump Rinsers epitomize the Kinetics view of cycle times. Not only are process intervals of paramount concern, the cleaning and maintenance cycles of even passive systems such as glove boxes and bottle carts are given serious consideration. This is one place where HVM is advanced—or compromised.

  • Criteria No. 5: TASK-SPECIFIC 

    Even when a process or chemistry is likely to be adjusted or altered, the task at hand generally remains more stable. Kinetics’ experience with dozens of wafer foundries around the world informs this view: Specialty products need to be discrete enough to perform needed functions without abandoning future capability.

No matter which stage and step warrants an investment in updated, upgraded performance, these five criteria guide the Kinetics team in building, installing and servicing wafer facility support equipment. As a world of successful clients demonstrates, the company is the top selection among progressive manufacturers. Click HERE to learn more.