UNIQUE WAFER PROCESS STEPS
With over eleven different metals involved, and 300 wafer process steps that must be performed in an ultra-clean environment, to say that semiconductor devices manufacturing has some unique challenges would be an understatement. As manufacturers continue to push to finer technology nodes, meeting today’s tight requirements requires the expertise that only comes with decades of experience.
Kinetics Solutions Group’s extensive line of specialty products and facility support equipment has supported the unique needs of wafer process steps for over 40 years. From the world’s first recirculating cleaning tank for silicon wafers, to a complete turnkey wet process systems and support equipment for diverse applications, Kinetics Solution Group’s products stand the test of time.
The magic happens in a 28,000 sq. foot facility in Livermore, CA, where numerous fabrication tools and support facilities required for specialized manufacturing are put through their paces daily, serving the global manufacturing industry.
The Center Feed™ was the semiconductor industry’s first recirculating and filtered bath, and is the basis for the Chemkleen™ bath, today’s gold standard. Primarily used for HF, BOE, and KOH applications, Chemkleen features a four-sided weir basket, customized filter chamber, heat exchange coils, and a compact immersion pump.
Kinetics designed its immersion pumps exclusively to meet the rigorous requirements of the semiconductor industry for recirculating filtered etch modules. Manufactured to be contamination-free and provide trouble free and efficient operation, pumps can be adapted for portable or stationary applications.
Kinetics manufactures a complete line of circulators for precision temperature control and low maintenance. WHRV and WHO are specifically designed for the semiconductor industry and used to control temperature in filtered etch modules and other chemical tanks where temperature stability and uniformity are vital.