Facility Support Equipment

UNIQUE WAFER PROCESS STEPS

With over eleven different metals involved, and 300 wafer process steps that must be performed in an ultra-clean environment, to say that semiconductor devices manufacturing has some unique challenges would be an understatement. As manufacturers continue to push to finer technology nodes, meeting today’s tight requirements requires the expertise that only comes with decades of experience.

Kinetics Solutions Group’s extensive line of specialty products and facility support equipment has supported the unique needs of wafer process steps for over 40 years. From the world’s first recirculating cleaning tank for silicon wafers, to a complete turnkey wet process systems and support equipment for diverse applications, Kinetics Solution Group’s products stand the test of time.

The magic happens in a 28,000 sq. foot facility in Livermore, CA, where numerous fabrication tools and support facilities required for specialized manufacturing are put through their paces daily, serving the global manufacturing industry.

QUARTZ TANKS

MEGATHERM™ High Temperature Quartz Baths were developed to stand up to the rigors of resist stripping, RCA cleans, and silicon nitride etch. The product line was designed especially for a low contamination and particle-free environment.

RECIRCULATING BATHS

The Center Feed™ was the semiconductor industry’s first recirculating and filtered bath, and is the basis for the Chemkleen™ bath, today’s gold standard. Primarily used for HF, BOE, and KOH applications, Chemkleen features a four-sided weir basket, customized filter chamber, heat exchange coils, and a compact immersion pump.

IMMERSION PUMPS

Kinetics designed its immersion pumps exclusively to meet the rigorous requirements of the semiconductor industry for recirculating filtered etch modules. Manufactured to be contamination-free and provide trouble free and efficient operation, pumps can be adapted for portable or stationary applications.

TEMPERATURE CONTROLLED CIRCULATORS

Kinetics manufactures a complete line of circulators for precision temperature control and low maintenance. WHRV and WHO are specifically designed for the semiconductor industry and used to control temperature in filtered etch modules and other chemical tanks where temperature stability and uniformity are vital.

QUICK DUMP RINSER

The MICROKLEEN™ Quick Dump Rinsers are designed with top adjustable spray rails, external bottom fill rails, and a larger dump door. These features allow the dump rinsers to fill faster, dump in a matter of seconds, and use less water.

PUMP STATIONS

Kinetics Chemblast™ series of pump stations are designed for situations where there is no AWN available, or the process tool is located away from the AWN. The pump stations collect spent chemistry from a dedicated tool, then pump it to the AWN or to a collection point.

DESICCATOR CABINETS

Whenever humidity-sensitive devices need environmental protection, Kinetics’ product line of desiccator shelves and storage cabinets are indispensable.

GLOVE BOXES

The goal of the lab glove box is to isolate and separate the operator from the devices within the controlled environment of the glove box. Glove boxes and other containment chambers are available in custom designs for every application and budget.

QUARTZ CLEANING SYSTEMS

Kinetics offers special quartz tube cleaning systems for thorough internal and external tube surface cleaning of diffusion tubes and similar quartzware.

BOTTLE WASH STATIONS

The Kinetics standard bottle wash station was designed to clean and hold up to 8 one-gallon bottles. It consists of two independent horizontal bottom spray rails with 4 vertical spray towers that assist in sliding the bottles.

BOTTLE CARTS

Bottle Carts are indispensable in active work areas where a handy and safe means for transporting bottled chemicals is required. Kinetics’ Bottle Carts are available in a variety of configurations.

WORK TABLES

Kinetics also offers competitively priced custom configured steel worktables.