MEGA® Slurry Metrology: complete process control

In the semiconductor industry, chemical metrology is critical to developing and maintaining consistent recipes for successful manufacturing processes.


For example, slurries of different consistencies and particle sizes are used in chemical mechanical planarization (CMP) processes. Chemical measurement systems are integrated into the process flow as part of the CMP steps to provide in-line monitoring that maintains the correct concentration of a slurry's composition.


The KINETICS in-line chemical instrumentation family is designed to support CMP processes in a variety of ways, from mixture component monitoring and replenishment, to particle size and distribution analysis, to real-time concentration measurement. Together, these products ensure the integrity of chemical formulations is maintained throughout the CMP process.

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