Kinetics has extensive experience designing and delivering highly-precise systems for the most critical oxide, tungsten, polysilicon, STI and copper CMP processes. Systems are available for dispensing pre-mixed slurry materials, or for blending and dispensing very challenging slurry mixtures. Kinetics slurry equipment supports the most demanding CMP planarization processes, in leading microelectronics facilities, worldwide.
The Kinetics SD 100 Slurry Dispense System is a reliable and configurable dispense system for critical slurry process applications. The system features configurable slurry management resources, designed to minimize slurry settling, agglomeration and damage.
The Kinetics SB 100 and SB 200 Slurry Blend & Dispense Systems are designed to provide the highest levels of CMP slurry quality and availability, for advanced semiconductor processing. Specific configurations are available for slurries with short shelf-life requirements. Several filtration options allow for filtration of large slurry agglomerates that can impede the CMP process. Featuring Kinetics proven weight-based blending and slurry measurement methodologies, the SB 100 and SB 200 are highly-effective systems that you can trust.