High-volume manufacturing is when production goals rule and where Aeris excels. Customized exactly where it matters most, a full complement of wet bench process stations holds the line by adhering to current SEMI Standards.

Kinetics offers manual, semi-automated and fully automated wet bench stations and fume hoods in a variety of high-spec materials that include FM-approved PVC-C as well as stainless steel.

Operator safety and ease-of-use is central to Kinetics’ automated wet process stations. Scheduling software and automated transport systems provide optimum control and repeatability for even the most sensitive wafer substrates. With each lot tracked by an ID code, the onboard Windows PC-based controller system automatically downloads process recipes to the CPU.

Wafers flow between the process baths and are monitored and transported efficiently to improve yields and manage cycle times. Aeris adds pace to the most complex systems while never losing sight of precision cleaning and wet processing operations. In-house smoke tunnel testing by Kinetics undergirds the Aeris line, which incorporates advanced venting baffles and deck tours that minimize airborne particle entrapment.

Semi-automated wet bench systems are built from production-proven technology platforms. With a PLC programmed to control all aspects of motion, process temperature control and rise features, Aeris stores multiple process recipes, and implements multi-tiered password protection.

At Kinetics, monitoring is crucial. So, color touch screens are used to display bench parameters at every stage and step, with alarm status always present.

Even before customization begins, every Aeris product offers a notable improvement on existing and competitive systems. With expansive feature and options lists, there’s no reason why superior high-volume wet bench technology shouldn’t be considered in new, expanded or retrofit process scenarios.

Automated Benches

Margin-minded flow that emphasizes safety and meets tight specifications at high volumes. Controlling multiple variables across time results in superior yields despite the challenges.

Semi-Automated Benches

When two or more processing tanks are in play, Aeris deploys linear transfer systems designed to hold single or dual wafer cassettes up to 200mm, or a single 300mm wafer cassette.


Take advantage of the Aeris platform to accelerate success

Wet process stations occupy an almost-daily share of a plant engineer’s mind, if not energy. That’s because adherence to current SEMI standards in a production environment requires hitting targets with consistency and minimal intervention—without compromising the safety of people, facilities and the environment.

Kinetics’ success in the widest range of settings around the world has resulted in an educated, discerning view of process technology. This means the team knows where and when a product, process or plant warrants the investment in elevated automation at the level that the Aeris platform provides. From this understanding comes three powerful, practical insights.


Facilities without clear objectives for part or component output levels, yield and uptime availability are poor candidates for more complete automation in wet bench stations. Simply put, their ability to justify the expense attached to calibrating, maintaining and monitoring them is encumbered. As a result, managers and engineers put more time into rationalizing benches and less energy into optimizing them.

Confidence in the targets is critical, as scheduling software and automated transport systems deliver control and repeatability that support higher volumes. As ID codes track each lot and process recipes are automatically downloaded to the CPU, a production rhythm is established quickly and reliably. Touch screens display bench parameters as yet another checkpoint is implemented, one directly linked to production targets.


The barriers to “better” are numerous, and are evidence that wet benches don’t merely complete discrete steps, but in fact link them in an environment filled with contamination potential. For example, the need to minimize airborne particle entrapment can be met through advanced venting baffle design and deck tours. This design insight needs to appear both in standard as well as custom wet bench options.

While these intentional features don’t require active or advanced automation, the use of such passive technology is essential to yield and quality objectives. Kinetics remains vigilant—and concerned—about systems in the market that substitute advanced displays and trademarked names for basic design rigor to support real and sustainable improvements. In summary: Electronics and data can’t compensate for a deep understanding of the physics and chemistry attached to wet benches.


Much like a high-performance car still needs to be steered, braked and stopped (and is vulnerable to tire blowouts), an automated bench must account for the realities of HVM manufacturing. This is where “what’s possible” needs to converge with “what’s probable” across thousands of cycles and months (years, really) of operation. While always looking for improvement, the goal is not peak performance, but effective, bankable production.

In the case of the Aeris platform, that means controlling all aspects of recipes, temperature and motion through baths, to say nothing of minimizing ambient particle counts and handling sensitive wafers in the process. Once again, Kinetics has participated in hundreds of installations where repeatable performance can be raised without pushing the wet bench to “red line” levels in order to impress customers or the industry as a whole.

Whether a standard or custom configuration is of greatest merit, the Kinetics team stands ready to turn their hard-won insights about automation into plant-specific recommendations. And if manual or semiautomated wet bench stations will be most advantageous, Kinetics is ready as well. Click HERE to learn more.